High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Computer-Aided Design (3BID)
Author(s) -
Jason D. Fowlkes,
Robert Winkler,
Brett B. Lewis,
Amalio FernándezPacheco,
Luka Skorić,
Dédalo SanzHernández,
Michael G. Stanford,
Eva Mutunga,
Philip D. Rack,
Harald Plank
Publication year - 2018
Publication title -
acs applied nano materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.227
H-Index - 29
ISSN - 2574-0970
DOI - 10.1021/acsanm.7b00342
Subject(s) - nanolithography , computer science , 3d printing , nanotechnology , cad , computer aided design , rapid prototyping , lithography , toolbox , materials science , engineering drawing , fabrication , engineering , optoelectronics , medicine , alternative medicine , pathology , composite material , programming language , operating system
Currently, there are few techniques that allow true 3D-printing on the nanoscale. The most promising candidate to fill this void is focused electron-beam-induced deposition (FEBID), a resist-free, nanofabrication compatible, direct-write method. The basic working principles of a computer-aided design (CAD) program (3BID) enabling 3D-FEBID is presented and simultaneously released for download. The 3BID capability significantly expands the currently limited toolbox for 3D-nanoprinting, providing access to geometries for optoelectronic, plasmonic, and nanomagnetic applications that were previously unattainable due to the lack of a suitable method for synthesis. The CAD approach supplants trial and error toward more precise/accurate FEBID required for real applications/device prototyping.
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