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Thermoresponsive Water-Soluble Polymer Layers and Water-Stable Copolymer Layers Synthesized by Atmospheric Plasma Initiated Chemical Vapor Deposition
Author(s) -
François Loyer,
Antoine Combrisson,
Korantin Omer,
Maryline MorenoCouranjou,
Patrick Choquet,
Nicolas D. Boscher
Publication year - 2018
Publication title -
acs applied materials and interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.535
H-Index - 228
eISSN - 1944-8252
pISSN - 1944-8244
DOI - 10.1021/acsami.8b14806
Subject(s) - materials science , copolymer , chemical engineering , polymer , ethylene glycol , chemical vapor deposition , atmospheric pressure plasma , caprolactam , water vapor , lower critical solution temperature , polymer chemistry , deposition (geology) , plasma , organic chemistry , nanotechnology , composite material , chemistry , paleontology , physics , quantum mechanics , sediment , engineering , biology
The growth of thermoresponsive layers with the atmospheric pressure plasma-initiated chemical vapor deposition (AP-PiCVD) process is reported for the first time. N-vinyl caprolactam (NVCL) was successfully homopolymerized and copolymerized with ethylene glycol dimethacrylate (EGDMA), yielding water-soluble and water-stable thermoresponsive thin films, respectively. Strong chemical retention and high thermoresponsivity were achieved, highlighting the ability of AP-PiCVD to grow functional conventional homopolymers and copolymers.

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