Substrate-Independent Epitaxial Growth of the Metal–Organic Framework MOF-508a
Author(s) -
Mark R. Wilson,
S.N. Barrientos-Palomo,
Phil Stevens,
N. L. Mitchell,
Gerda Oswald,
C. M. Nagaraja,
J. P. S. Badyal
Publication year - 2018
Publication title -
acs applied materials and interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.535
H-Index - 228
eISSN - 1944-8252
pISSN - 1944-8244
DOI - 10.1021/acsami.7b16029
Subject(s) - materials science , epitaxy , microporous material , metal organic framework , chemical engineering , imidazole , substrate (aquarium) , layer (electronics) , benzene , crystal growth , surface modification , metal , nanotechnology , crystallography , organic chemistry , adsorption , composite material , metallurgy , chemistry , oceanography , geology , engineering
Plasmachemical deposition is a substrate-independent method for the conformal surface functionalization of solid substrates. Structurally well-defined pulsed plasma deposited poly(1-allylimidazole) layers provide surface imidazole linker groups for the directed liquid-phase epitaxial (layer-by-layer) growth of metal-organic frameworks (MOFs) at room temperature. For the case of microporous [Zn (benzene-1,4-dicarboxylate)-(4,4'-bipyridine) 0.5 ] (MOF-508), the MOF-508a polymorph containing two interpenetrating crystal lattice frameworks undergoes orientated Volmer-Weber growth and displays CO 2 gas capture behavior at atmospheric concentrations in proportion to the number of epitaxially grown MOF-508 layers.
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