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Varying Surface Chemistries for p-Doped and n-Doped Silicon Nanocrystals and Impact on Photovoltaic Devices
Author(s) -
Tamilselvan Velusamy,
Somak Mitra,
Manuel MacíasMontero,
Vladimír Švrček,
Davide Mariotti
Publication year - 2015
Publication title -
acs applied materials and interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.535
H-Index - 228
eISSN - 1944-8252
pISSN - 1944-8244
DOI - 10.1021/acsami.5b06577
Subject(s) - materials science , doping , photoluminescence , microplasma , dopant , quantum yield , nanotechnology , nanocrystal , optoelectronics , silicon , photovoltaic system , optics , physics , fluorescence , plasma , quantum mechanics , ecology , biology
Doping of quantum confined nanocrystals offers unique opportunities to control the bandgap and the Fermi energy level. In this contribution, boron-doped (p-doped) and phosphorus-doped (n-doped) quantum confined silicon nanocrystals (SiNCs) are surface-engineered in ethanol by an atmospheric pressure radio frequency microplasma. We reveal that surface chemistries induced on the nanocrystals strongly depend on the type of dopants and result in considerable diverse optoelectronic properties (e.g., photoluminescence quantum yield is enhanced more than 6 times for n-type SiNCs). Changes in the position of the SiNCs Fermi levels are also studied and implications for photovoltaic application are discussed.

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