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Enhancing the Reactivity of Al/CuO Nanolaminates by Cu Incorporation at the Interfaces
Author(s) -
Lorena Marín,
Charith E. Nanayakkara,
Jean-François Veyan,
B. Warot-Fonrose,
S. Joulié,
Alain Estève,
Christophe Tenailleau,
Yves J. Chabal,
Carole Rossi
Publication year - 2015
Publication title -
acs applied materials and interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.535
H-Index - 228
eISSN - 1944-8252
pISSN - 1944-8244
DOI - 10.1021/acsami.5b02653
Subject(s) - materials science , reactivity (psychology) , copper , transmission electron microscopy , layer (electronics) , alloy , aluminium , chemical engineering , metal , spectroscopy , nanotechnology , composite material , metallurgy , medicine , alternative medicine , physics , pathology , quantum mechanics , engineering
In situ deposition of a thin (∼5 nm) layer of copper between Al and CuO layers is shown to increase the overall nanolaminate material reactivity. A combination of transmission electron microscopy imaging, in situ infrared spectroscopy, low energy ion scattering measurements, and first-principles calculations reveals that copper spontaneously diffuses into aluminum layers (substantially less in CuO layers). The formation of an interfacial Al:Cu alloy with melting temperature lower than pure Al metal is responsible for the enhanced reactivity, opening a route to controlling the stochiometry of the aluminum layer and increasing the reactivity of the nanoenergetic multilayer systems in general.

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