z-logo
open-access-imgOpen Access
Integration of the Rhombohedral BiSb(0001) Topological Insulator on a Cubic GaAs(001) Substrate
Author(s) -
Dima Sadek,
Daya S. Dhungana,
R. Coratger,
Corentin Durand,
Arnaud Proietti,
Quentin Gravelier,
Benjamin Reig,
E. Daran,
Pier Francesco Fazzini,
F. Cristiano,
Alexandre Arnoult,
Sébastien Plissard
Publication year - 2021
Publication title -
acs applied materials and interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.535
H-Index - 228
eISSN - 1944-8252
pISSN - 1944-8244
DOI - 10.1021/acsami.1c08477
Subject(s) - topological insulator , spintronics , materials science , epitaxy , bismuth , condensed matter physics , magnetoresistance , substrate (aquarium) , semiconductor , antimony , insulator (electricity) , optoelectronics , topology (electrical circuits) , layer (electronics) , nanotechnology , ferromagnetism , metallurgy , physics , magnetic field , oceanography , mathematics , quantum mechanics , combinatorics , geology
Bismuth-antimony alloy (Bi 1 -  x Sb x ) is the first reported 3D topological insulator (TI). Among many TIs reported to date, it remains the most promising for spintronic applications thanks to its large conductivity, its colossal spin Hall angle, and the possibility to build low-current spin-orbit-torque magnetoresistive random access memories. Nevertheless, the 2D integration of TIs on industrial standards is lacking. In this work, we report the integration of high-quality rhombohedral BiSb(0001) topological insulators on a cubic GaAs(001) substrate. We demonstrate a clear epitaxial relationship at the interface, a fully relaxed TI layer, and the growth of a rhombohedral matrix on top of the cubic substrate. The antimony composition of the Bi 1 -  x Sb x layer is perfectly controlled and covers almost the whole TI window. For optimized growth conditions, the sample generates a semiconductor band structure at room temperature in the bulk and exhibits metallic surface states at 77 K.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom