z-logo
open-access-imgOpen Access
Influence of the Rear Interface on Composition and Photoluminescence Yield of CZTSSe Absorbers: A Case for an Al2O3 Intermediate Layer
Author(s) -
A. Cabas-Vidani,
Léo Choubrac,
J.A. Marquez,
Thomas Unold,
Matthias Maiberg,
Roland Scheer,
Hu Li,
Klaus Leifer,
Robin Pauer,
Evgeniia Gilshtein,
Ayodhya N. Tiwari,
Yaroslav E. Romanyuk
Publication year - 2021
Publication title -
acs applied materials and interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.535
H-Index - 228
eISSN - 1944-8252
pISSN - 1944-8244
DOI - 10.1021/acsami.1c02437
Subject(s) - kesterite , materials science , passivation , annealing (glass) , photoluminescence , energy conversion efficiency , carrier lifetime , optoelectronics , analytical chemistry (journal) , layer (electronics) , nanotechnology , solar cell , composite material , silicon , czts , chemistry , chromatography
The rear interface of kesterite absorbers with Mo back contact represents one of the possible sources of nonradiative voltage losses (Δ V oc,nrad ) because of the reported decomposition reactions, an uncontrolled growth of MoSe 2 , or a nonoptimal electrical contact with high recombination. Several intermediate layers (IL), such as MoO 3 , TiN, and ZnO, have been tested to mitigate these issues, and efficiency improvements have been reported. However, the introduction of IL also triggers other effects such as changes in alkali diffusion, altered morphology, and modifications in the absorber composition, all factors that can also influence Δ V oc,nrad . In this study, the different effects are decoupled by designing a special sample that directly compares four rear structures (SLG, SLG/Mo, SLG/Al 2 O 3 , and SLG/Mo/Al 2 O 3 ) with a Na-doped kesterite absorber optimized for a device efficiency >10%. The IL of choice is Al 2 O 3 because of its reported beneficial effect to reduce the surface recombination velocity at the rear interface of solar cell absorbers. Identical annealing conditions and alkali distribution in the kesterite absorber are preserved, as measured by time-of-flight secondary ion mass spectrometry and energy-dispersive X-ray spectroscopy. The lowest Δ V oc,nrad of 290 mV is measured for kesterite grown on Mo, whereas the kesterite absorber on Al 2 O 3 exhibits higher nonradiative losses up to 350 mV. The anticipated field-effect passivation from Al 2 O 3 at the rear interface could not be observed for the kesterite absorbers prepared by the two-step process, further confirmed by an additional experiment with air annealing. Our results suggest that Mo with an in situ formed MoSe 2 remains a suitable back contact for high-efficiency kesterite devices.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom