Investigation of Plasma Deposited Boron Phosphide and Its Contact to Silicon | Zendy

A. A. Maksimova | Zendy; A V Uvarov | Zendy; A I Baranov | Zendy; А.С. Гудовских | Zendy; Dmitri A. Kudryashov | Zendy; Ekaterina Vyacheslavova | Zendy; I. A. Morozov | Zendy; Sylvain Le Gall | Zendy; JeanPaul Kleider | Zendy

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Investigation of Plasma Deposited Boron Phosphide and Its Contact to Silicon

Author(s) -

A. A. Maksimova,

A V Uvarov,

A I Baranov,

А.С. Гудовских,

Dmitri A. Kudryashov,

Ekaterina Vyacheslavova,

I. A. Morozov,

Sylvain Le Gall,

JeanPaul Kleider

Publication year - 2022

Publication title -

acs applied energy materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.833

H-Index - 36

ISSN - 2574-0962

DOI - 10.1021/acsaem.1c02704

Subject(s) - silicon , materials science , substrate (aquarium) , boron , analytical chemistry (journal) , deep level transient spectroscopy , chemical vapor deposition , layer (electronics) , indium phosphide , band gap , fermi level , deposition (geology) , optoelectronics , nanotechnology , chemistry , electron , gallium arsenide , paleontology , oceanography , physics , organic chemistry , chromatography , quantum mechanics , sediment , biology , geology

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