Efficient Passivation and Low Resistivity for p+-Si/TiO2 Contact by Atomic Layer Deposition | Zendy

Naeimeh Mozaffari | Zendy; Heping Shen | Zendy; Yanting Yin | Zendy; Yueliang Li | Zendy; Daniel Hiller | Zendy; Daniel A. Jacobs | Zendy; Hieu T. Nguyen | Zendy; Pheng Phang | Zendy; Gunther G. Andersson | Zendy; Ute Kaiser | Zendy; Thomas P. White | Zendy; Klaus Weber | Zendy; Kylie Catchpole | Zendy

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Efficient Passivation and Low Resistivity for p⁺-Si/TiO₂ Contact by Atomic Layer Deposition

Author(s) -

Naeimeh Mozaffari,

Heping Shen,

Yanting Yin,

Yueliang Li,

Daniel Hiller,

Daniel A. Jacobs,

Hieu T. Nguyen,

Pheng Phang,

Gunther G. Andersson,

Ute Kaiser,

Thomas P. White,

Klaus Weber,

Kylie Catchpole

Publication year - 2020

Publication title -

acs applied energy materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.833

H-Index - 36

ISSN - 2574-0962

DOI - 10.1021/acsaem.0c00378

Subject(s) - passivation , materials science , silicon , perovskite (structure) , atomic layer deposition , layer (electronics) , tandem , crystalline silicon , optoelectronics , carrier lifetime , electrical resistivity and conductivity , contact resistance , energy conversion efficiency , deposition (geology) , doping , nanotechnology , composite material , chemistry , electrical engineering , crystallography , paleontology , engineering , sediment , biology

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