Critical Level of Nitrogen Incorporation in Silicon Oxynitride Films: Transition of Structure and Properties, toward Enhanced Anticorrosion Performance | Zendy

Konstantina Christina Topka | Zendy; Babacar Diallo | Zendy; Maxime Puyo | Zendy; Paris Papavasileiou | Zendy; Charlotte Lebesgue | Zendy; Cécile Genevois | Zendy; Yann Tison | Zendy; Cédric Charvillat | Zendy; Diane Samélor | Zendy; R. Laloo | Zendy; Daniel Sadowski | Zendy; François Senocq | Zendy; Thierry Sauvage | Zendy; Hugues Vergnes | Zendy; MarieJoëlle Menu | Zendy; Brigitte Caussat | Zendy; Viviane Turq | Zendy; Nadia Pellerin | Zendy; Constantin Vahlas | Zendy

Open Access

Critical Level of Nitrogen Incorporation in Silicon Oxynitride Films: Transition of Structure and Properties, toward Enhanced Anticorrosion Performance

Author(s) -

Konstantina Christina Topka,

Babacar Diallo,

Maxime Puyo,

Paris Papavasileiou,

Charlotte Lebesgue,

Cécile Genevois,

Yann Tison,

Cédric Charvillat,

Diane Samélor,

R. Laloo,

Daniel Sadowski,

François Senocq,

Thierry Sauvage,

Hugues Vergnes,

MarieJoëlle Menu,

Brigitte Caussat,

Viviane Turq,

Nadia Pellerin,

Constantin Vahlas

Publication year - 2022

Publication title -

acs applied electronic materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.379

H-Index - 4

ISSN - 2637-6113

DOI - 10.1021/acsaelm.2c00018

Subject(s) - silicon oxynitride , materials science , silicon , nitrogen , chemical engineering , optoelectronics , nanotechnology , engineering physics , chemical physics , chemistry , silicon nitride , engineering , organic chemistry

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