Progression of Alignment in Thin Films of Cylinder-Forming Block Copolymers upon Shearing
Author(s) -
Raleigh L. Davis,
Brian T. Michal,
Paul Chaikin,
Richard A. Register
Publication year - 2015
Publication title -
macromolecules
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.994
H-Index - 313
eISSN - 1520-5835
pISSN - 0024-9297
DOI - 10.1021/acs.macromol.5b01028
Subject(s) - materials science , shearing (physics) , copolymer , polystyrene , composite material , shear rate , critical resolved shear stress , shear stress , wetting , thin film , cylinder , nanotechnology , polymer , rheology , geometry , mathematics
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