Thermodynamic Preference for Atom Adsorption on versus Intercalation into Multilayer Graphene
Author(s) -
Wei Li,
Li Huang,
Michael C. Tringides,
James W. Evans,
Yong Han
Publication year - 2020
Publication title -
the journal of physical chemistry letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.563
H-Index - 203
ISSN - 1948-7185
DOI - 10.1021/acs.jpclett.0c02887
Subject(s) - intercalation (chemistry) , adsorption , ionic radius , graphene , van der waals force , density functional theory , ionic bonding , atom (system on chip) , chemical physics , materials science , thermodynamics , chemical bond , chemistry , computational chemistry , molecule , inorganic chemistry , ion , nanotechnology , physics , organic chemistry , computer science , embedded system
The thermodynamic preference of a foreign atom for adsorption on versus intercalation into a graphitic surface is of fundamental and widespread interest. From an exhaustive first-principles density functional theory investigation for 38 typical elements over the periodic table, we reveal a quasilinear correlation between the Shannon effective ionic radius and the chemical-potential difference for a single atom from adsorption to intercalation at multilayer graphene surfaces. A critical Shannon radius is found to be around 0.10 nm, below (above) which intercalation (adsorption) is more favorable for elements with ionic-like bonding after intercalation. Single atoms with van der Waals-biased bonding show some deviation from the linear relationship, while single atoms for the elements with covalent-like bonding do not favor intercalation relative to adsorption. An energy decomposition analysis indicates that the chemical-potential difference determining the thermodynamic preference of a foreign atom for adsorption versus intercalation results from the competition between the electronic and elastic strain effects.
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