Open AccessCorrection to “Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3 and HfO2”
Author(s) -
Karsten Arts,
Mikko Utriainen,
Riikka L. Puurunen,
W. M. M. Kessels,
Harm C. M. Knoops
Publication year - 2019
Publication title -
the journal of physical chemistry c
Language(s) - English
Resource type - Journals
eISSN - 1932-7455
pISSN - 1932-7447
DOI - 10.1021/acs.jpcc.9b11082
Subject(s) - atomic layer deposition , harm , citation , notice , physics , nanotechnology , library science , computer science , materials science , layer (electronics) , psychology , political science , social psychology , law
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