Open AccessInhibition of Oxygen Scavenging by TiN at the TiN/SiO2 Interface by Atomic-Layer-Deposited Al2O3 Protective Interlayer
Author(s) -
Е. О. Филатова,
Sergei S. Sakhonenkov,
Aleksei S. Konashuk,
Sergey Kasatikov,
Valeri Afanas’ev
Publication year - 2019
Publication title -
the journal of physical chemistry c
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.401
H-Index - 289
eISSN - 1932-7455
pISSN - 1932-7447
DOI - 10.1021/acs.jpcc.9b05800
Subject(s) - tin , materials science , x ray photoelectron spectroscopy , silicon , layer (electronics) , xanes , titanium , oxygen , thin film , chemical engineering , analytical chemistry (journal) , nanotechnology , chemistry , spectroscopy , metallurgy , physics , organic chemistry , chromatography , quantum mechanics , engineering
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