Deciphering the Adsorption Mechanisms of RGD Subunits: l -Aspartic Acid on Cu(110)
Author(s) -
Roberta Totani,
Christophe Méthivier,
Hervé Cruguel,
ClaireMarie Pradier,
Vincent Humblot
Publication year - 2017
Publication title -
the journal of physical chemistry c
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.401
H-Index - 289
eISSN - 1932-7455
pISSN - 1932-7447
DOI - 10.1021/acs.jpcc.7b04948
Subject(s) - aspartic acid , chemistry , overlayer , scanning tunneling microscope , x ray photoelectron spectroscopy , monolayer , molecule , adsorption , self assembled monolayer , crystallography , materials science , amino acid , organic chemistry , nanotechnology , chemical engineering , biochemistry , engineering
International audienceIn this work we present a detailed surface science characterization of L-Aspartic acid adsorption on a Cu(110) surface. We replaced the traditional sublimation method to obtain molecular films by dosing aspartic acid directly from an aqueous solution through an Electrospray Ionization (ESI) device. X-ray Photoelectron Spectroscopy (XPS) and Polarization Modulation Reflection Absorption Infra Red Spectroscopy (PM-RAIRS) evidenced different adsorption states ranging from sub-monolayer regime up to multilayers. Molecules-substrate interactions guide the creation of the pattern observed in the sub-monolayer, but molecule-molecule interactions are prevailing from a certain coverage stage, promoting the overlayer growth while leaving exposed areas of bare copper. This is evidenced by Scanning Tunneling Microscopy (STM) results, showing that single aspartic acid molecules self-organize in a 2D chiral network at low coverage and start originating new molecular layers even before a saturated monolayer has been reached
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