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Adsorption of Hydrogen at the GaN(0001̅) Surface: An Ab Initio Study
Author(s) -
Maria Ptasinska,
Jacek Piechota,
Stanisław Krukowski
Publication year - 2015
Publication title -
the journal of physical chemistry c
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.401
H-Index - 289
eISSN - 1932-7455
pISSN - 1932-7447
DOI - 10.1021/acs.jpcc.5b00836
Subject(s) - ab initio , fermi level , hydrogen , adsorption , ab initio quantum chemistry methods , band gap , hydrogen atom , atomic physics , chemistry , materials science , condensed matter physics , electron , physics , molecule , organic chemistry , alkyl , quantum mechanics
Ab initio calculations are used to determine the basic\udphysical properties of hydrogen adsorption at the N-terminated\udGaN(0001̅) surface. It was shown that the Fermi level is pinned at the\udvalence band maximum (VBM) for hydrogen coverage θH = 0.75 ML\udabove which the Fermi level is shifted to the conduction band\udminimum (CBM). Application of the electron counting rule (ECR)\udindicates that for θH = 0.75 ML, the Fermi level is not pinned, located\udin the bandgap. Ab initio calculations confirmed that hydrogen\udadsorption energy depends on the Fermi level at the surface as\udpredicted and explained earlier (Krukowski et al. J. Appl. Phys. 2013,\ud114, 143705 and Krukowski et al. J. Appl. Phys. 2013, 115, 043529).\udThe adsorption energy contains electron transfer contribution, below\udθH = 0.75 ML to VBM and above that coverage to CBM; thus it is\udΔEads(H) ≅ 5.8 eV and ΔEads(H) ≅ 3.1 eV for a single H atom for these coverage ranges, respectively. Accordingly, the H2\udequilibrium pressure at the GaN(0001̅) surface varies from very low for θH < 0.75 ML, about 10−20 bar, to a fraction of a bar for\udθH > 0.75 ML.This work has been partially supported by the Polish Ministry of Science and Higher Education within the SICMAT Project financed under the European Founds for Regional Development (Contract No. UDA-POIG.01.03.01-14-155/09)Jacek Piechot

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