Open AccessPlasma-Enhanced Atomic Layer Deposition of Cobalt and Cobalt Nitride: What Controls the Incorporation of Nitrogen?
Author(s) -
Gerben van Straaten,
Rick Deckers,
Martijn F. J. Vos,
W. M. M. Kessels,
Mariadriana Creatore
Publication year - 2020
Publication title -
the journal of physical chemistry c
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.401
H-Index - 289
eISSN - 1932-7455
pISSN - 1932-7447
DOI - 10.1021/acs.jpcc.0c04223
Subject(s) - cobalt , nitride , atomic layer deposition , nitrogen , analytical chemistry (journal) , materials science , desorption , layer (electronics) , chemical engineering , chemistry , inorganic chemistry , adsorption , nanotechnology , organic chemistry , engineering
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