Open AccessMechanisms of TiN Effective Workfunction Tuning at Interfaces with HfO2 and SiO2
Author(s) -
Е. О. Филатова,
Aleksei S. Konashuk,
Sergei S. Sakhonenkov,
Aidar U. Gaisin,
Nadiia Kolomiiets,
Valeri Afanas’ev,
H.F.W. Dekkers
Publication year - 2020
Publication title -
the journal of physical chemistry c
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.401
H-Index - 289
eISSN - 1932-7455
pISSN - 1932-7447
DOI - 10.1021/acs.jpcc.0c03605
Subject(s) - tin , materials science , x ray photoelectron spectroscopy , oxide , getter , layer (electronics) , metal , atomic layer deposition , photoemission spectroscopy , redistribution (election) , optoelectronics , analytical chemistry (journal) , nanotechnology , chemical engineering , chemistry , metallurgy , chromatography , politics , political science , law , engineering
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