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Quantification of Charge Transfer at the Interfaces of Oxide Thin Films
Author(s) -
Qingping Meng,
Guangyong Xu,
Huolin L. Xin,
Eric A. Stach,
Yimei Zhu,
Dong Su
Publication year - 2019
Publication title -
the journal of physical chemistry a
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.756
H-Index - 235
eISSN - 1520-5215
pISSN - 1089-5639
DOI - 10.1021/acs.jpca.9b02802
Subject(s) - materials science , scanning transmission electron microscopy , electron energy loss spectroscopy , valence (chemistry) , chemical physics , oxide , thin film , dielectric , work function , electronic structure , transmission electron microscopy , condensed matter physics , analytical chemistry (journal) , nanotechnology , optoelectronics , chemistry , physics , organic chemistry , layer (electronics) , chromatography , metallurgy
The interfacial electronic distribution in transition-metal oxide thin films is crucial to their interfacial physical or chemical behaviors. Core-loss electron energy-loss spectroscopy (EELS) may potentially give valuable information of local electronic density of state at high spatial resolution. Here, we studied the electronic properties at the interface of Pb(Zr 0.2 Ti 0.8 )O 3 (PZT)/4.8 nm La 0.8 Sr 0.2 MnO 3 (LSMO)/SrTiO 3 (STO) using valance-EELS with a scanning transmission electron microscope. Modeled with dielectric function theory, the charge transfer in the vicinity of the interfaces of PZT/LSMO and LSMO/STO was determined from the shifts of plasma peaks of valence EELS (VEELS), agreeing with theoretical prediction. Our work demonstrates that the VEELS method enables a high-efficient quantification of the charge transfer at interfaces, shedding light on the charge-transfer issues at heterogenous interfaces in physical and chemical devices.

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