Partial Least-Squares Regression as a Tool To Predict Fluoropolymer Surface Modification by Dielectric Barrier Discharge in a Corona Process Configuration in a Nitrogen–Organic Gaseous Precursor Environment
Author(s) -
Julien Vallade,
Stéphane Turgeon,
Gaétan Laroche
Publication year - 2018
Publication title -
industrial and engineering chemistry research
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.878
H-Index - 221
eISSN - 1520-5045
pISSN - 0888-5885
DOI - 10.1021/acs.iecr.8b00228
Subject(s) - partial least squares regression , contact angle , dielectric barrier discharge , nitrogen , fluoropolymer , corona discharge , surface modification , analytical chemistry (journal) , ultraviolet , plasma , chemistry , chemical engineering , materials science , dielectric , composite material , organic chemistry , polymer , optoelectronics , electrode , engineering , statistics , mathematics , quantum mechanics , physics
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