Open AccessAtomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronics
Author(s) -
Miika Mattinen,
Georgi Popov,
Marko Vehkamäki,
Peter King,
Kenichiro Mizohata,
Pasi Jalkanen,
J. Räisänen,
Markku Leskelä,
Mikko Ritala
Publication year - 2019
Publication title -
chemistry of materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.741
H-Index - 375
eISSN - 1520-5002
pISSN - 0897-4756
DOI - 10.1021/acs.chemmater.9b01688
Subject(s) - atomic layer deposition , monolayer , materials science , semiconductor , nanotechnology , thin film , layer (electronics) , photodetector , optoelectronics
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