Enhanced Carrier Transport and Bandgap Reduction in Sulfur-Modified BiVO4 Photoanodes
Author(s) -
Marlene Lamers,
Wenjie Li,
Marco Favaro,
David E. Starr,
Dennis Friedrich,
Sheikha Lardhi,
Luigi Cavallo,
Moussab Harb,
Roel van de Krol,
Lydia Helena Wong,
Fatwa F. Abdi
Publication year - 2018
Publication title -
chemistry of materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.741
H-Index - 375
eISSN - 1520-5002
pISSN - 0897-4756
DOI - 10.1021/acs.chemmater.8b03859
Subject(s) - bismuth vanadate , band gap , materials science , x ray photoelectron spectroscopy , optoelectronics , charge carrier , oxide , electron mobility , bismuth , nanotechnology , analytical chemistry (journal) , chemical engineering , chemistry , photocatalysis , biochemistry , engineering , metallurgy , catalysis , chromatography
Recent progress on bismuth vanadate (BiVO4) has shown it to be among the highest performing metal oxide photoanode materials. However, further improvement, especially in the form of thin film photoelectrodes, is hampered by its poor charge carrier transport and its relatively wide bandgap. Here, sulfur incorporation is used to address these limitations. A maximum bandgap decrease of ∼0.3 eV is obtained, which increases the theoretical maximum solar-to-hydrogen efficiency from 9 to 12%. Hard X-ray photoelectron spectroscopy measurements as well as density functional theory calculations show that the main reason for the bandgap decrease is an upward shift of the valence band maximum. Time-resolved microwave conductivity measurements reveal a ∼3 times higher charge carrier mobility compared to unmodified BiVO4, resulting in a ∼70% increase in the carrier diffusion length. This work demonstrates that sulfur incorporation can be a promising and practical method to improve the performance of wide-bandgap metal ...
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