z-logo
open-access-imgOpen Access
Design of Metastable Tin Titanium Nitride Semiconductor Alloys
Author(s) -
André Bikowski,
Sebastian Siol,
Jing Gu,
Aaron M. Holder,
John S. Mangum,
Brian P. Gorman,
William Tumas,
Stephan Lany,
Andriy Zakutayev
Publication year - 2017
Publication title -
chemistry of materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.741
H-Index - 375
eISSN - 1520-5002
pISSN - 0897-4756
DOI - 10.1021/acs.chemmater.7b02122
Subject(s) - materials science , tin , metastability , nitride , titanium nitride , titanium , band gap , semiconductor , optoelectronics , nanotechnology , metallurgy , chemistry , organic chemistry , layer (electronics)
We report on design of optoelectronic properties in previously unreported metastable tin titanium nitride alloys with spinel crystal structure. Theoretical calculations predict that Ti alloying in metastable Sn3N4 compound should improve hole effective mass by up to 1 order of magnitude, while other optical bandgaps remains in the 1–2 eV range up to x ∼ 0.35 Ti composition. Experimental synthesis of these metastable alloys is predicted to be challenging due to high required nitrogen chemical potential (ΔμN ≥ +1.0 eV) but proven to be possible using combinatorial cosputtering from metal targets in the presence of nitrogen plasma. Characterization experiments confirm that thin films of such (Sn1–xTix)3N4 alloys can be synthesized up to x = 0.45 composition, with suitable optical band gaps (1.5–2.0 eV), moderate electron densities (1017 to 1018 cm–3), and improved photogenerated hole transport (by 5×). Overall, this study shows that it is possible to design the metastable nitride materials with properties su...

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom