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Polymorphic Control of Solution-Processed Cu2SnS3 Films with Thiol–Amine Ink Formulation
Author(s) -
Kristopher M. Koskela,
Carlos Mora Perez,
Dmitry B. Eremin,
Jake M. Evans,
Marissa J. Strumolo,
Nathan S. Lewis,
Oleg V. Prezhdo,
Richard L. Brutchey
Publication year - 2022
Publication title -
chemistry of materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.741
H-Index - 375
eISSN - 1520-5002
pISSN - 0897-4756
DOI - 10.1021/acs.chemmater.2c01612
Subject(s) - thiol , inkwell , amine gas treating , materials science , chemical engineering , chemistry , nanotechnology , organic chemistry , composite material , engineering

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