Open AccessAtomic-Scale Structure and Its Impact on Chemical Properties of Aluminum Oxide Layers Prepared by Atomic Layer Deposition on Silica
Author(s) -
Monu Kaushik,
César Leroy,
Zixuan Chen,
David Gajan,
Elena Willinger,
Christoph R. Müller,
Franck Fayon,
Dominique Massiot,
Alexey Fedorov,
Christophe Copéret,
Anne Lesage,
Pierre Florian
Publication year - 2021
Publication title -
chemistry of materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.741
H-Index - 375
eISSN - 1520-5002
pISSN - 0897-4756
DOI - 10.1021/acs.chemmater.1c00516
Subject(s) - atomic layer deposition , amorphous solid , aluminosilicate , oxide , atomic units , catalysis , amorphous silica alumina , chemical shift , aluminium , chemistry , materials science , layer (electronics) , chemical engineering , crystallography , nanotechnology , organic chemistry , physics , quantum mechanics , engineering
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