Thermal Atomic Layer Etching of Aluminum Oxide (Al2O3) Using Sequential Exposures of Niobium Pentafluoride (NbF5) and Carbon Tetrachloride (CCl4): A Combined Experimental and Density Functional Theory Study of the Etch Mechanism | Zendy

Varun Sharma | Zendy; Simon D. Elliott | Zendy; Tom Blomberg | Zendy; Suvi Haukka | Zendy; Michael Givens | Zendy; M. Tuominen | Zendy; Mikko Ritala | Zendy

Open Access

Thermal Atomic Layer Etching of Aluminum Oxide (Al₂O₃) Using Sequential Exposures of Niobium Pentafluoride (NbF₅) and Carbon Tetrachloride (CCl₄): A Combined Experimental and Density Functional Theory Study of the Etch Mechanism

Author(s) -

Varun Sharma,

Simon D. Elliott,

Tom Blomberg,

Suvi Haukka,

Michael Givens,

M. Tuominen,

Mikko Ritala

Publication year - 2021

Publication title -

chemistry of materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 3.741

H-Index - 375

eISSN - 1520-5002

pISSN - 0897-4756

DOI - 10.1021/acs.chemmater.1c00142

Subject(s) - etching (microfabrication) , niobium oxide , x ray photoelectron spectroscopy , analytical chemistry (journal) , materials science , oxide , silicon , nitride , layer (electronics) , transmission electron microscopy , niobium , halide , chemistry , inorganic chemistry , chemical engineering , nanotechnology , metallurgy , organic chemistry , engineering

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