Atmospheric Plasma-Enhanced Spatial Chemical Vapor Deposition of SiO2 Using Trivinylmethoxysilane and Oxygen Plasma | Zendy

Việt Hương Nguyễn | Zendy; Abderrahime Sekkat | Zendy; César Masse de La Huerta | Zendy; Fadi Zoubian | Zendy; Chiara Crivello | Zendy; Juan RubioZuazo | Zendy; Moustapha Jaffal | Zendy; M. Bonvalot | Zendy; C. Vallée | Zendy; Olivier Aubry | Zendy; Hervé Rabat | Zendy; Dunpin Hong | Zendy; David MuñozRojas | Zendy

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Atmospheric Plasma-Enhanced Spatial Chemical Vapor Deposition of SiO₂ Using Trivinylmethoxysilane and Oxygen Plasma

Author(s) -

Việt Hương Nguyễn,

Abderrahime Sekkat,

César Masse de La Huerta,

Fadi Zoubian,

Chiara Crivello,

Juan RubioZuazo,

Moustapha Jaffal,

M. Bonvalot,

C. Vallée,

Olivier Aubry,

Hervé Rabat,

Dunpin Hong,

David MuñozRojas

Publication year - 2020

Publication title -

chemistry of materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 3.741

H-Index - 375

eISSN - 1520-5002

pISSN - 0897-4756

DOI - 10.1021/acs.chemmater.0c01148

Subject(s) - plasma , chemical vapor deposition , plasma processing , oxygen , deposition (geology) , plasma enhanced chemical vapor deposition , plasma chemistry , materials science , atmospheric pressure plasma , chemical engineering , analytical chemistry (journal) , chemistry , environmental chemistry , nanotechnology , organic chemistry , physics , paleontology , quantum mechanics , sediment , engineering , biology

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