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RF Sputtering of ZnO (002) Thin Films on Top of 3C-SiC-on-Si (100) Substrates for Low Cost Piezoelectric Devices
Author(s) -
Visakh Valliyil Sasi,
Adeel Iqbal,
Kien Chaik,
Philip Tanner,
Alan Iacopi,
Faisal Mohd-Yasin
Publication year - 2016
Publication title -
procedia engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.32
H-Index - 74
ISSN - 1877-7058
DOI - 10.1016/j.proeng.2016.11.346
Subject(s) - materials science , piezoelectricity , annealing (glass) , thin film , sputtering , optoelectronics , epitaxy , sputter deposition , diffraction , composite material , optics , nanotechnology , physics , layer (electronics)
In this paper, we deposited c-axis oriented ZnO thin films on top of epitaxial 3C-SiC/Si (100) substrates using RF magnetron sputtering. We investigated the effect of O2/Ar ratio and the post-annealing temperature. The grazing angle incident x-ray diffraction results show that ZnO thin-films are highly oriented along the (002) crystalline direction between the O2/Ar ratio of 30% to 50%, at the post-annealing temperature of 600 ˚C in nitrogen environment. The recipe from this work can be used to develop low cost piezoelectric devices such as an energy harvester.Griffith Sciences, Griffith School of EngineeringFull Tex

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