Electron Beam Stability in the Energy Recovery Linac for the Lithographic free Electron Laser
Author(s) -
Ya. V. Getmanov,
Н.А. Винокуров,
O.A. Shevchenko,
I. V. Davidyuk
Publication year - 2016
Publication title -
physics procedia
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.26
H-Index - 61
ISSN - 1875-3892
DOI - 10.1016/j.phpro.2016.11.017
Subject(s) - free electron laser , linear particle accelerator , microelectronics , laser , electron , physics , lithography , superconductivity , cathode ray , free electron model , transverse plane , electron beam lithography , beam (structure) , optics , materials science , optoelectronics , nuclear physics , resist , nanotechnology , condensed matter physics , structural engineering , engineering , layer (electronics)
According to microelectronic production leaders the lithography based on the free electron laser (FEL) could become the main technology for the elements mass production with scale to 5 nm in the nearest future. One of the main problem is the absence of the working FEL with required parameters. The feasibility study of those FEL based on superconducting energy-recovery linac (ERL) was made in Budker INP. The ERL average current is limited by longitudinal and transverse instabilities, caused by interaction between electron beam and its induced fields in the superconducting cavities. The estimations of the threshold currents and ERL parameters were made.
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