Large-Area Laser-Lift-Off Processing in Microelectronics
Author(s) -
Ralph Delmdahl,
Rainer Pätzel,
Jan Brune
Publication year - 2013
Publication title -
physics procedia
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.26
H-Index - 61
ISSN - 1875-3892
DOI - 10.1016/j.phpro.2013.03.075
Subject(s) - microelectronics , materials science , laser , optoelectronics , excimer laser , transistor , lift (data mining) , diode , thin film transistor , polymer , nanotechnology , optics , computer science , layer (electronics) , electrical engineering , composite material , physics , voltage , data mining , engineering
Laser lift-off is an enabling technology for microelectronics growth markets such as light emitting diodes, densely packaged semiconductor devices, and flexible displays. For example, thin film transistor structures fabricated on top of polymer layers spun on glass carriers must be delaminated from rigid substrates to create lightweight and rugged flexible displays on polymers. Low-thermal-budget processes are generically required to protect adjacent functional films. Excimer lasers provide short UV wavelength and short pulse duration required for highly-localized energy coupling. The high output power of excimer lasers enables a large processing footprint and the high-throughput rates needed in mass manufacturing
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