Open AccessIn- and out-plane transport properties of chemical vapor deposited TiO2 anatase films
Author(s) -
Adeline Miquelot,
Laurène Youssef,
Christina Villeneuve-Faure,
Nathalie Prud’homme,
Nita Dragoe,
Amr A. Nada,
V. Rouessac,
S. Roualdès,
Joëlle Bassil,
M. Zakhour,
M. Nakhl,
Constantin Vahlas
Publication year - 2021
Publication title -
journal of materials science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.813
H-Index - 177
eISSN - 1573-4803
pISSN - 0022-2461
DOI - 10.1007/s10853-021-05955-6
Subject(s) - metalorganic vapour phase epitaxy , chemical vapor deposition , materials science , plasma enhanced chemical vapor deposition , electrical resistivity and conductivity , doping , nanotechnology , optoelectronics , epitaxy , layer (electronics) , engineering , electrical engineering
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