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A Novel Approach to Compact Model Parameter Extraction for Excimer Laser Annealed Complementary Thin Film Transistors
Author(s) -
Yiming Li,
Shao-Ming Yu
Publication year - 2004
Publication title -
journal of computational electronics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.332
H-Index - 36
eISSN - 1572-8137
pISSN - 1569-8025
DOI - 10.1007/s10825-004-7057-6
Subject(s) - thin film transistor , materials science , transistor , subthreshold conduction , optoelectronics , excimer laser , transconductance , laser , optics , electrical engineering , nanotechnology , physics , layer (electronics) , voltage , engineering
A unified physical-based model parameter extraction technique for excimer laser annealed lower temperature polycrystalline silicon (LTPS) complementary thin film transistors (TFTs) is for the first time proposed. For two well-known compact models of LTPS TFT, Rensselaer Polytechnic Institute (RPI) V1 and V2 models, our approach sequentially optimizes the model parameters in the regions of linear, subthreshold, saturation, and leakage. Compared with the measured results, the extracted ID−VG, ID−VD, transconductance, and output conductance are within 3% of accuracy. The agreement with the experimental data is excellent for the n- and p-type LTPS TFTs with different length and width. This extraction technique bridges the fabrication of LTPS TFTs and the design of complementary system on panel circuits.

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