Open AccessZone plate focused soft X-ray lithography
Author(s) -
Adam F. G. Leontowich,
Adam P. Hitchcock
Publication year - 2011
Publication title -
applied physics a
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.485
H-Index - 149
eISSN - 1432-0630
pISSN - 0947-8396
DOI - 10.1007/s00339-010-6172-4
Subject(s) - lithography , x ray lithography , zone plate , optics , materials science , scanning electron microscope , electron beam lithography , lens (geology) , resist , x ray , soft lithography , transmission electron microscopy , nanotechnology , optoelectronics , diffraction , physics , fabrication , alternative medicine , layer (electronics) , pathology , medicine
The zone plate focused soft X-rays of a scanning transmission X-ray microscope have been used to pattern poly(methyl methacrylate) and poly(dimethylglutarimide) films by a direct write method which is analogous to lithography with a focused electron beam. The lithographic characteristics of both polymers have been determined for 300 eV X-rays. With low doses (1 MGy), developed lines 40±5 nm wide were created in poly(methyl methacrylate). At higher doses an exposure spreading phenomenon substantially increases the lateral dimensions of the developed patterns. The spreading mechanism has been identified as the point-spread function of the zone plate lens. The performance of focused soft X-ray lithography is compared to other direct write methods. The practicality of a dedicated focused soft X-ray writer instrument is discussed.
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