Open AccessNear field induced defects and influence of the liquid layer thickness in Steam Laser Cleaning of silicon wafers
Author(s) -
Florian Lang,
M. Mosbacher,
P. Leǐderer
Publication year - 2003
Publication title -
applied physics a
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.485
H-Index - 149
eISSN - 1432-0630
pISSN - 0947-8396
DOI - 10.1007/s00339-003-2101-0
Subject(s) - wafer , silicon , materials science , vaporization , laser , particle (ecology) , fluence , layer (electronics) , particle size , composite material , optoelectronics , optics , chemistry , physics , oceanography , organic chemistry , geology
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