Open AccessA high-sensitivity in situ optical diagnostic technique for laser cleaning of transparent substrates
Author(s) -
N. Chaoui,
J. Solı́s,
C. N. Afonso,
T. Fourrier,
T. Muehlberger,
G. Schrems,
M. Mosbacher,
D. Bäuerle,
M. Bertsch,
P. Leǐderer
Publication year - 2003
Publication title -
applied physics a
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.485
H-Index - 149
eISSN - 1432-0630
pISSN - 0947-8396
DOI - 10.1007/s00339-002-2032-1
Subject(s) - materials science , micrometer , laser , polystyrene , in situ , wavelength , polyimide , optics , irradiation , optoelectronics , transmission (telecommunications) , nanotechnology , chemistry , polymer , composite material , physics , layer (electronics) , electrical engineering , nuclear physics , engineering , organic chemistry
A differential optical transmission technique has been used to monitor in situ the efficiency of laser cleaning for the removal of sub-micrometer-sized particles on substrates transparent at the monitoring wavelength. This technique has been applied to the removal of sub-micrometer polystyrene particles on polyimide substrates using laser pulses of 30 ps duration at 292 nm while probing the material transmission at 633 nm. The sensitivity achieved -1/104 for the transmission changes induced upon single-pulse laser exposure - allows us to monitor the removal of just a few sub-micron-sized particles from the probed region inside the irradiated area.Support of this work by the European Union in the framework of the TMR project Laser Cleaning (Contract No. ERB-FMRXCT-980188) is gratefully acknowledged.Peer Reviewe
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