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Super-conducting niobium films produced by means of UHV arc
Author(s) -
J. Langner,
Marek J. Sadowski,
K. Czaus,
R. Mirowski,
Jan Witkowski,
L. Catàni,
A. Cianchi,
R. Russo,
S. Tazzari,
F. Tazzioli,
D. Proch,
N. N. Koval,
Yu H Akhmadeev
Publication year - 2004
Publication title -
czechoslovak journal of physics
Language(s) - English
Resource type - Journals
eISSN - 1572-9486
pISSN - 0011-4626
DOI - 10.1007/bf03166508
Subject(s) - materials science , niobium , residual resistivity , vacuum arc , electrical resistivity and conductivity , arc (geometry) , tantalum , thin film , ultra high vacuum , grain size , analytical chemistry (journal) , composite material , metallurgy , plasma , nanotechnology , chemistry , physics , geometry , mathematics , quantum mechanics , chromatography , electrical engineering , engineering
The paper shows that high-quality super-conducting Nb films can be deposited by means of arc discharges under ultra-high vacuum conditions. The critical temperatureT c of Nb-films obtained with a planar cathodic arc Ultra High Vacuum (UHV) system, is very close to that of pure bulk niobiumT c=9.26 K and the transition to super-conducting state is very narrow. The films have higher Residual Resistivity Ratio (RRR) values (up to 80) and larger grain sizes, as compared with sputtered Nb-films deposited at the same temperature.

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