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Damage threshold determination of bulk polymer samples using pulsed photothermal deflection technique
Author(s) -
Krishnapriya Subramonian Rajasree,
Ayeswarya Ravikumar,
P. Radhakrishnan,
V. P. N. Nampoori,
C. P. G. Vallabhan
Publication year - 1992
Publication title -
bulletin of materials science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.35
H-Index - 72
eISSN - 0973-7669
pISSN - 0250-4707
DOI - 10.1007/bf02927444
Subject(s) - materials science , photothermal therapy , full width at half maximum , deflection (physics) , laser , irradiation , optics , wavelength , detector , polymer , photothermal spectroscopy , pulsed laser , beam (structure) , pulse duration , optoelectronics , composite material , nanotechnology , physics , nuclear physics
Photothermal deflection technique was used for determining the laser damage threshold of polymer samples of teflon (PTFE) and nylon. The experiment was conducted using a Q-switched Nd-YAG laser operating at its fundamental wavelength (1-06μm, pulse width 10 nS FWHM) as irradiation source and a He-Ne laser as the probe beam, along with a position sensitive detector. The damage threshold values determined by photothermal deflection method were in good agreement with those determined by other methods.

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