Nickel silicide contact for silicon solar cells | Zendy

S. Bandopadhyay | Zendy; Utpal Gangopadhyay | Zendy; K. Mukhopadhyay | Zendy; H. Saha | Zendy; A.P. Chatterjee | Zendy

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Nickel silicide contact for silicon solar cells

Author(s) -

S. Bandopadhyay,

Utpal Gangopadhyay,

K. Mukhopadhyay,

H. Saha,

A.P. Chatterjee

Publication year - 1992

Publication title -

bulletin of materials science

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.35

H-Index - 72

eISSN - 0973-7669

pISSN - 0250-4707

DOI - 10.1007/bf02745298

Subject(s) - materials science , silicide , silicon , nickel , metallurgy , x ray photoelectron spectroscopy , equivalent series resistance , solar cell , contact resistance , optoelectronics , nanotechnology , layer (electronics) , chemical engineering , electrical engineering , voltage , engineering

Electroless nickel metallization on textured front surface is carried out to fabricate large area (13%) efficient silicon solar cells. It is established through XPS analysis that NiSi is formed at the front grid contact on the texturized surface at relatively low temperature leading to a low value of series resistance of the solar cells.

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