Current-voltage characteristics of Ag, Al, Ni-(n)CdTe junctions
Author(s) -
P. C. Sarmah,
A. Rahman
Publication year - 2001
Publication title -
bulletin of materials science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.35
H-Index - 72
eISSN - 0973-7669
pISSN - 0250-4707
DOI - 10.1007/bf02708640
Subject(s) - materials science , equivalent series resistance , schottky barrier , cadmium telluride photovoltaics , sputtering , schottky diode , doping , diode , layer (electronics) , optoelectronics , metal , voltage , thin film , nanotechnology , metallurgy , electrical engineering , engineering
Schottky barriers of Ag, Al, Ni-(n)CdTe structures have been prepared and studied. The films were prepared by rf sputtering and doped with Cd metal. Diode ideality factor of these junctions are greater than unity and barrier height varies from 0.6–0.7 eV and are affected by room illumination. Photovoltaic effect of these junctions was very poor and fill factor below 0.4. Low doping concentration, high defect density, presence of an interfacial layer and presence of high series resistance are perceived to affect theJ—V characteristic.
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom