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On the origin of electrodeposition mechanism of ZnO on ITO substrate
Author(s) -
Jaeyoung Lee,
Sang Cheol Nam,
Yongsug Tak
Publication year - 2005
Publication title -
korean journal of chemical engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.609
H-Index - 60
eISSN - 1975-7220
pISSN - 0256-1115
DOI - 10.1007/bf02701479
Subject(s) - quartz crystal microbalance , hydroxide , zinc hydroxide , zinc , electrochemistry , substrate (aquarium) , scanning electron microscope , indium tin oxide , deposition (geology) , materials science , inorganic chemistry , chemical engineering , adsorption , indium , chemistry , analytical chemistry (journal) , thin film , electrode , nanotechnology , metallurgy , paleontology , oceanography , sediment , engineering , composite material , biology , geology , chromatography
Zinc oxide (ZnO) was potentiostatically deposited on indium tin oxide (ITO) substrates. Comparing of the theoretical mass/charge ratio with experimental value measured byin-situ electrochemical quartz crystal microbalance, the origin of deposition mechanism of ZnO could be explained as follows: (i) surface pH enhancement due to the adsorption of hydroxide ion; (ii) the formation of intermediate species (i.e., zinc hydroxide (Zn(OH)+); (iii) ZnO deposition with production of water.Ex-situ morphological and structural analyses by scanning electron microscope and X-ray diffraction strongly supported the deposition mechanism of ZnO. This also showed that hexagonal shaped ZnO islands were first formed on ITO cathode and grew into compact ZnO films, and the formation behaviour of ZnO was clearly explainedvia analysis of the profile of measured current.

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