z-logo
open-access-imgOpen Access
Thermal decomposition of tungsten hexacarbonyl: CVD of W‐containing films under Pd codeposition and VUV assistance
Author(s) -
Krisyuk Vladislav V.,
Koretskaya Tatyana P.,
Turgambaeva Asiya E.,
Trubin Sergey V.,
Korolkov Ilya V.,
Debieu Olivier,
Duguet Thomas,
Igumenov Igor K.,
Vahlas Constantin
Publication year - 2015
Publication title -
physica status solidi (c)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 46
eISSN - 1610-1642
pISSN - 1862-6351
DOI - 10.1002/pssc.201510020
Subject(s) - chemical vapor deposition , materials science , palladium , oxide , hydrogen , metal , tungsten , carbide , oxygen , thermal decomposition , graphite , analytical chemistry (journal) , chemistry , catalysis , metallurgy , nanotechnology , organic chemistry , biochemistry , chromatography
Experiments on chemical vapor deposition of W(CO) 6 ‐derived films on silicon substrates were carried out at total pressure of 5‐10 Torr within the temperature range of 250‐350 °C; in Ar or H 2 flow. Metallic, carbide and oxide phases composed the obtained films. Deposition in presence of hydrogen results in the increase of the metal content in the film. Sublimed palladium hexafluoracetylacetonate Pd(hfa) 2 was used for Pd catalytic promotion of the deposition process. Codeposition with Pd(hfa) 2 in hydrogen increases W‐metal fraction and oxygen content while the Pd content is up to 10 at.%. Influence of vacuum ultraviolet (VUV) radiation from Xe excimer lamp ( λ ∼172 nm) on the quality of the obtained films was investigated. It was found that VUV irradiation can reduce the oxygen‐content in the film while W‐metal fraction slightly increases. In all films, oxygen was in the form of WO 3 and carbon was mainly incorporated as a graphite metastable phase. The influence of other chemical additives is discussed. (© 2015 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom