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Silicon in AlN: shallow donor and DX behaviors
Author(s) -
Son N. T.,
Bickermann M.,
Janzén E.
Publication year - 2011
Publication title -
physica status solidi c
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 46
eISSN - 1610-1642
pISSN - 1862-6351
DOI - 10.1002/pssc.201001030
Subject(s) - shallow donor , electron paramagnetic resonance , dopant , silicon , doping , chemistry , materials science , nuclear magnetic resonance , optoelectronics , physics
In unintentionally Si‐doped AlN bulk samples, an electron paramagnetic resonance (EPR) spectrum with characteristics of a shallow donor, previously assigned to the shallow Si donor, was observed at room temperature in darkness. Temperature dependent studies of the EPR signal showed that Si is a DX center in AlN. However, with the negatively charged DX – state determined to be only ∼78 meV below the neutral shallow donor state, Si should behave as a shallow dopant in AlN at normal device operating temperatures. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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