Ga co‐doping in Cz‐grown silicon ingots to overcome limitations of B and P compensated silicon feedstock for PV applications
Author(s) -
Forster Maxime,
Fourmond Erwann,
Einhaus Roland,
Lauvray Hubert,
Kraiem Jed,
Lemiti Mustapha
Publication year - 2011
Publication title -
physica status solidi c
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 46
eISSN - 1610-1642
pISSN - 1862-6351
DOI - 10.1002/pssc.201000330
Subject(s) - ingot , silicon , doping , materials science , carrier lifetime , boron , gallium , impurity , raw material , crystallization , degradation (telecommunications) , solar cell , optoelectronics , metallurgy , chemical engineering , electronic engineering , chemistry , organic chemistry , alloy , engineering
In this paper, we investigate gallium co‐doping during CZ crystallization of boron and phosphorus compensated Si. It is shown that the addition of gallium yields a fully p‐type ingot with high resistivity despite high B and P contents in the silicon. Segregation of doping impurities is consistent with theory. Minority carrier lifetime and majority carrier mobility measurements indicate that this material is suitable for the realization of solar cells with comparable efficiencies to standard material. Significant light‐induced degradation of minority carrier lifetime is however revealed to occur in this material. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom