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Light emitting diodes on silicon substrates: preliminary results
Author(s) -
Bondi Alexandre,
Guo Weiming,
Pedesseau Laurent,
BoyerRichard Soline,
Folliot Hervé,
Chevalier Nicolas,
Cornet Charles,
Letoublon Antoine,
Durand Olivier,
Labbé Chistophe,
Gicquel Maud,
Lecorre Alain,
Even Jacky,
Loualiche Slimane,
Moreac Alain
Publication year - 2009
Publication title -
physica status solidi c
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 46
eISSN - 1610-1642
pISSN - 1862-6351
DOI - 10.1002/pssc.200881728
Subject(s) - silicon , quantum well , photoluminescence , optoelectronics , superlattice , materials science , molecular beam epitaxy , raman spectroscopy , photonics , diode , epitaxy , phonon , condensed matter physics , optics , nanotechnology , physics , laser , layer (electronics)
III‐V quantum wells (QW) superlattices have been grown by molecular beam epitaxy on GaP substrates for photonics applications on silicon. We first present room temperature photoluminescence (PL) results for GaAsP/GaP QWs. A detailed analysis of low temperature PL experiments is then performed. QW contribution is pointed out, and the structuration of the QW emission is attributed to LA phonon replica. A comparison with electronic bandstructure is performed, and a discussion is proposed on the nature of the observed transition (direct or indirect). Finally, it is shown that these QWs can be used as active zone in light emitters on silicon. Growth of good quality GaP epilayers on silicon is also presented. The crystalline quality of the deposited GaP near the GaP/Si interface is studied by Raman spectroscopy. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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