Thermal tuning of planar Bragg gratings in silicon‐on‐insulator rib waveguides
Author(s) -
Homampour Shabnam,
Bulk Michael P.,
Jessop Paul E.,
Knights Andrew P.
Publication year - 2009
Publication title -
physica status solidi c
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 46
eISSN - 1610-1642
pISSN - 1862-6351
DOI - 10.1002/pssc.200881298
Subject(s) - silicon on insulator , materials science , planar , waveguide , grating , fiber bragg grating , optics , wafer , fabrication , silicon , optoelectronics , silicon photonics , photonics , refractive index , wavelength , physics , medicine , computer graphics (images) , alternative medicine , pathology , computer science
The Bragg grating forms an essential element in optical telecommunication and sensing applications. In the case of integrated optics, it is necessary to incorporate the grating into a waveguide during device fabrication. Specifically for silicon photonics this process is deemed necessary to be compatible with standard processing technology. We have recently developed a method for the fabrication of Bragg gratings via self‐ion implantation of silicon‐on‐insulator (SOI) waveguides, such that the surface of the waveguide remains planar. This has significant benefits for a number of devices especially those requiring subsequent wafer bonding. Here we report work that shows the ability of these devices to be thermally tuned. As the waveguides are heated, a positive shift in the resonant wavelength is induced due to the temperature dependence of the index of refraction and thermal expansion of the silicon. The observed shift is 0.080 nm/degree, in good agreement with theoretical prediction. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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