z-logo
open-access-imgOpen Access
Luminescence properties of Al x Ga 1–x N(0.4 < x < 0.5)/Al y Ga 1–y N (0.6 < y ≤ 1) quantum structures grown by gas source molecular beam epitaxy
Author(s) -
Nikishin S.,
Borisov B.,
Kuryatkov V.,
Song D.,
Holtz M.,
Garrett G. A.,
Sarney W. L.,
Sampath A. V.,
Shen H.,
Wraback M.
Publication year - 2008
Publication title -
physica status solidi c
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 46
eISSN - 1610-1642
pISSN - 1862-6351
DOI - 10.1002/pssc.200778699
Subject(s) - cathodoluminescence , photoluminescence , luminescence , analytical chemistry (journal) , sapphire , materials science , molecular beam epitaxy , transmission electron microscopy , quantum dot , crystallography , epitaxy , chemistry , nanotechnology , optoelectronics , laser , optics , physics , layer (electronics) , chromatography
We report structural and optical properties of Al x Ga 1–x N (0.4 < x < 0.5)/Al y Ga 1–y N (0.6 < y ≤ 1) quantum structures grown by gas source molecular beam epitaxy with ammonia on (0001) sapphire substrates. The structures are designed for light emission at ∼ 280 nm. The Al x Ga 1–x N (0.4 < x < 0.5) well material was grown under two dimensional (2D), three dimensional (3D), and (2D+3D) conditions by the varying group‐III/ammonia ratio. The formation of nanoscale islands, or quantum dots (QDs), in the wells grown in 3D and (2D+3D) modes was observed using transmission electron microscopy. Optical properties are investigated using room temperature cathodoluminescence and time‐resolved photoluminescence. Systematic studies allow us to obtain well growth conditions to produce ∼ 60 fold intensity enhancement over purely two‐dimensional structures. Under these conditions, corresponding to deposition ∼ 10 monolayers of well material, we obtain emission at ∼ 280 nm with narrowest line width and longest photoluminescence decay time. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom