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Optical quality improvement of InGaAs/AlAs/AlAsSb coupled double quantum wells grown by molecular beam epitaxy
Author(s) -
Kasai J.,
Mozume T.,
Yoshida H.,
Simoyama T.,
Gopal A. V.,
Ishikawa H.
Publication year - 2004
Publication title -
physica status solidi (c)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 46
eISSN - 1610-1642
pISSN - 1610-1634
DOI - 10.1002/pssc.200303942
Subject(s) - molecular beam epitaxy , quantum well , optoelectronics , epitaxy , ultrashort pulse , materials science , wavelength , diffusion , absorption (acoustics) , laser , optics , chemistry , nanotechnology , layer (electronics) , physics , thermodynamics , composite material
We have grown InGaAs/AlAs/AlAsSb coupled double quantum wells (C‐DQWs) with AlAs diffusion‐stopping layers by molecular beam epitaxy. An obtained sample had many cross‐hatched lines, suggesting relatively poor structural quality. Optical measurements, however, revealed that the optical quality of the C‐DQWs was greatly improved compared to earlier C‐DQWs without AlAs diffusion‐stopping layers. The intersubband absorption saturation intensity in the present C‐DQW sample was extremely low, measuring 34 fJ/μm 2 at the optical communication wavelength of 1.62 μm, while ultrafast response times of about 600 fs were maintained. (© 2004 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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