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Time‐Resolved Grazing Incidence X‐Ray Absorption Spectroscopy for the In Situ Investigation of the Initial Stages of Sputter‐Deposited Copper Thin Films
Author(s) -
Lützenkirchen-Hecht Dirk,
Stötzel Jan,
Just Justus,
Müller Oliver,
Bornmann Benjamin,
Frahm Ronald
Publication year - 2022
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.202100514
Subject(s) - materials science , copper , thin film , sputtering , sputter deposition , analytical chemistry (journal) , crystallite , absorption spectroscopy , spectroscopy , float glass , deposition (geology) , absorption (acoustics) , coalescence (physics) , optics , composite material , metallurgy , nanotechnology , chemistry , physics , chromatography , quantum mechanics , astrobiology , paleontology , sediment , biology
The sputter deposition and the growth of thin copper films on float glass substrates are in situ studied using grazing incidence, reflection mode X‐ray absorption fine structure spectroscopy with subsecond time resolution. The experimental data are compared with model calculations, assuming the presence of crystalline, face‐centered cubic metallic Cu nanostructures. From a detailed analysis of the measured spectra, the film thickness as well as the surface roughness is determined, leading to a detailed understanding of the films growth as a function of the sputter deposition time. In particular, different stages of film growth can clearly be distinguished from the fits of the experimental data. The results suggest the formation of isolated, approximately nm‐sized copper clusters in the initial phase of the film deposition for the first few seconds, a coalescence phase with a nominal thickness of ≈1.5−2.8 nm, constant roughness of about 1.4 nm for the subsequent ≈5 s, and finally 3D growth of the Cu crystallites in the film for later stages of film growth. Further prospects of the methodology are given.