High performance Schottky UV detectors (265–100 nm) using n‐Al 0.5 Ga 0.5 N on AlN epitaxial layer
Author(s) -
Miyake H.,
Yasukawa H.,
Kida Y.,
Ohta K.,
Shibata Y.,
Motogaito A.,
Hiramatsu K.,
Ohuchi Y.,
Tadatomo K.,
Hamamura Y.,
Fukui K.
Publication year - 2003
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
eISSN - 1521-396X
pISSN - 0031-8965
DOI - 10.1002/pssa.200303487
Subject(s) - responsivity , ultraviolet , optoelectronics , materials science , schottky diode , schottky barrier , photodetector , detector , epitaxy , wavelength , layer (electronics) , optics , physics , nanotechnology , diode
A high responsivity spectrum in the near ultraviolet (UV) and the vacuum UV (VUV) region was realized using Schottky UV detectors consisting of Al 0.5 Ga 0.5 N on an AlN epitaxial layer. The cut‐off wavelength of AlGaN UV detectors was 4.7 eV (265 nm), a value that corresponds to the band gap of Al 0.5 Ga 0.5 N. The contrast of responsivity between the near UV and the visible was about 10 4 . The GaN Schottky detector hads a high responsivity region in the near‐UV from 3.4 to 5.0 eV (250–360 nm), whereas the AlGaN UV detector had a high responsivity in the UV–VUV region from 4.7 to 12.4 eV (100–265 nm). From these results, the fabricated AlGaN‐based UV photodetectors can likely be used in detectors for the UV–VUV region. (© 2003 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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