Removal of poly(methyl methacrylate) in diblock copolymers films studied by grazing incidence small‐angle X‐ray scattering | Zendy

Freychet Guillaume | Zendy; Maret Mireille | Zendy; Tiron Raluca | Zendy; Chevalier Xavier | Zendy; Gharbi Ahmed | Zendy; FernandezRegulez Marta | Zendy; Gergaud Patrice | Zendy

Open Access

Removal of poly(methyl methacrylate) in diblock copolymers films studied by grazing incidence small‐angle X‐ray scattering

Author(s) -

Freychet Guillaume,

Maret Mireille,

Tiron Raluca,

Chevalier Xavier,

Gharbi Ahmed,

FernandezRegulez Marta,

Gergaud Patrice

Publication year - 2016

Publication title -

journal of polymer science part b: polymer physics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.65

H-Index - 145

eISSN - 1099-0488

pISSN - 0887-6266

DOI - 10.1002/polb.24017

Subject(s) - grazing incidence small angle scattering , copolymer , materials science , methyl methacrylate , polystyrene , scattering , polymer chemistry , methacrylate , chemical engineering , scanning electron microscope , poly(methyl methacrylate) , fabrication , polymer , composite material , optics , small angle neutron scattering , physics , neutron scattering , engineering , medicine , alternative medicine , pathology

Self‐assembly of diblock copolymers (BCP) into periodic arrays is a promising route to generate templates for the fabrication of nanoscopic elements, when one block is selectively removed. In cylindrical morphology polystyrene‐block‐poly(methyl methacrylate) (PS‐ b ‐PMMA) copolymer (BCP) films, the efficiency of different processes for removing the PMMA from cylinders is studied using grazing incidence small angle X‐ray scattering (GISAXS), x‐ray reflectivity and critical dimension scanning electron microscopy. The detailed analysis of the GISAXS patterns leads to the determination of the depth of cylindrical holes left by removal of the PMMA. It is found that the combination of a preliminary UV exposure followed by a wet treatment allows to remove totally the PMMA blocks. Furthermore, the optimization of both UV exposition time and solvent allows to preserve the PS matrix and interestingly for nanolithographic applications to decrease the process costs. © 2016 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2016 , 54 , 1137–1144

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research